Introduction from Salva-
"
* after the ID week it was decided to repeat the whole ID alignment
* the silicon alignment was very slow and paintfull because of the software "inestabilities". We had to use the nightlies because of the software cleanup we couldn't go back to older releases and use the latest refinements.
* At some point we messed with the NewTracking (the new default) and the CTB one, and whith the material effects on/off. All this was reported at one ID alignment meeting.
* With our monitoring plots we knew the alignment was slightly worse, specially for B field off runs. For B field on it was more or less the same (in terms of PIX and SCT residuals). With Tobi's plots the B field on runs pixel residuals look clearly worse, I think this is because of plotting the biased/unbiased residuals. Or may be it is the tracking NewTracking vs CTB.
*The silicon alignment had some large level 1 shifts.
*The silicon constants were handed to the TRT with almost no time to react before the deadline for the second reprocessing. However the TRT team did a great job and finished on time.
*Later the TRT team improved the Level 2 alignment constants. "
The decision has been made, We will use these constatnts for the second reprocessing.
These constants have become 'InDetAlign-REPC-01' and 'TRTAlign-REPC-01' which is also 'InDetAlign-ES1-UPD1-01'
TRT L1 alignment wrt to new Si alignment changed by 100s of microns.
Maybe b/c the endcap alignments were also taken in to account during the barrel alignment?